Veeco 产品
MKS 产品

Process Materials 产品

Sputtering
Components 产品

THIN-FILM
镀膜设计软件 产品

 

LARGE AREA PLANAR SPUTTERING SOURCES :

 

 

INCREASE YOUR PRODUCTION AND PROFITABILITY!

AN EFFICIENT MAGNETRON DESIGN MEANS:

  INCREASED TARGET UTILIZATION (average 45%)

  INCREASED POWER LEVELS

  LOWER MAINTENANCE

  REDUCED DOWNTIME

  INCREASED PROCESS STABILITY OVER TARGET LIFETIME

  The SCI planar cathodes can be provided in any length and in widths of 4” or greater.

RETROFIT EXISTING PLANARS

WITH HIGH UTILIZATION MAGNET ASSEMBLIES

   In many cases SCI can replace outdated and inefficient magnet assemblies in your existing cathodes with the more efficient magnetron design. This provides all the benefits of the better magnetics without the expense of buying new cathodes!

 

 


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