Options and Accessories |
 |
Substrate Fixtures
The HDG can be supplies with single rotation water cooled fixtures with automated or manual tip-tilt capabilities. Solutions are available for substrates up to 6-inches (150mm) in diameter. For smaller substrates, the HDG can also be supplied with a planetary fixture. |
 |
Ion Source and Neutralizers
Both RF and DC ion source and their corresponding neutralizers can be integrated into the system. The HDG system supports deposition sources of 3cm - 6cm in diameter and Etch or assist sources from 3cm - 12cm in diameter. Please refer to Veeco's Ion Source Products for specific information on the ion sources options available. |
 |
Gas Flow Control
A GFC-1000U Gas Flow Controller will be provided for the ion beam source(s) for automatic control of process gases. The GFC-1000U can be configured for two or three channels of operation with independent or ratio control. |
 |
High Vacuum Pump
The HDG can be configured with either a CTI-10 cryo pump with ON BOARD?control or a Leybold turbo pump. |
 |
Sourcerer Ion Beam System Manager
Automated HDG systems are supplied with the Sourcerer Ion Beam System Manager running on a dedicated control platform in a remote computer rack. Sourcerer is the premier deposition system controller available today. Providing an intuitive touch-screen user interface, system control is literally at your finger tips. |
 |
Target Fixture
When configured for deposition functionality, the HDG is fitted with a water cooled 4-target assembly. The assembly supports use of un to four different target materials in a single process run. The target fixture supports four 5-inch (125mm) targets. |
